ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,787,677, issued on Nov. 3, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Material layer deposition methods, semiconductor processing systems, and related computer program products" was invented by Gregory Deye (Phoenix), Arun Murali (Tempe, Ariz.), Frederick Aryeetey (Phoenix), Caleb Miskin (Mesa, Ariz.) and Alexandros Demos (Scottsdale, Ariz.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A material layer deposition method includes supporting a substrate in a preclean module and exposing the substrate to a preclean etchant while supported within the preclean module. The substrate is transferred to a deposition module and exposed to an adso...