US Patent Issued to ASM IP Holding on May 26 for "Substrate processing apparatus with flow control ring, and substrate processing method" (Japanese Inventor)

ALEXANDRIA, Va., May 26 -- United States Patent no. 12,637,766, issued on May 26, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Substrate processing apparatus with flow control ring, and substrate processing method" was invented by Naoto Tsuji (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "Examples of a substrate processing apparatus includes a chamber, a susceptor provided in the chamber, a shower head provided above the susceptor, and a flow control ring having a shape to surround the susceptor, the flow control ring having a first top surface and a second top surface that has an annular shape and is provided closer to an inner edge of the flow control ring than the first top surface a...