ALEXANDRIA, Va., July 15 -- United States Patent no. 12,665,168, issued on June 23, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Wafer processing apparatus using plasma phase shift" was invented by Jeongsu Lee (Pyeongtaek-si, South Korea), Dongok Shin (Suwon, South Korea), Songwhe Herr (Seongnam-si, South Korea) and DaeYoun Kim (Seo-gu, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A wafer processing system using plasma would be presented. The system may comprise a plurality of reaction chambers disposed on a platform, each of them being configured to process wafers; a plasma generator coupled to the plurality of reaction chambers individually and configured to generate plasma wit...