ALEXANDRIA, Va., July 14 -- United States Patent no. 12,685,118, issued on July 14, was assigned to ASM IP Holding B.V. (Almere, Netherlands).
"Methods and systems for filling a gap" was invented by Jan Willem Maes (Wilrijk, Belgium), Elina Farm (Helsinki), Charles Dezelah (Helsinki) and Shinya Iwashita (Helsinki).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed are methods and systems for filling a gap. An exemplary method comprises providing a substrate to a reaction chamber. The substrate comprises the gap. The method comprises filling the gap with a metal-containing material."
The patent was filed on Sept. 27, 2022, under Application No. 17/953,847.
*For further information, including images, ch...