US Patent Issued to ASM IP Holding on July 14 for "Deposition of oxide thin films" (Finnish, American Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,685,045, issued on July 14, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Deposition of oxide thin films" was invented by Suvi P. Haukka (Helsinki), Elina Farm (Helsinki), Raija H. Matero (Helsinki), Eva E. Tois (Espoo, Finland), Hidemi Suemori (Helsinki), Antti Juhani Niskanen (Helsinki), Sung-Hoon Jung (Tempe, Ariz.) and Petri Raisanen (Gilbert, Ariz.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods are provided herein for deposition of oxide films. Oxide films may be deposited, including selective deposition of oxide thin films on a first surface of a substrate relative to a second, different surface of the same substrate. For exa...