US Patent Issued to ASM IP Holding on Jan. 20 for "Methods and apparatus for depositing a chalcogenide film and structures including the film" (Finnish Inventors)

ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,532,674, issued on Jan. 20, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Methods and apparatus for depositing a chalcogenide film and structures including the film" was invented by Miika Mattinen (Helsinki), Mikko Ritala (Espoo, Finland) and Markku Leskela (Espoo, Finland).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods for depositing group 5 chalcogenides on a substrate are disclosed. The methods include cyclical deposition techniques, such as atomic layer deposition. The group 5 chalcogenides can be two-dimensional films having desirable electrical properties."

The patent was filed on Aug. 31, 2020, under Application No. 17/007,2...