US Patent Issued to ASM IP Holding on Feb. 24 for "Dual pyrometer systems for substrate temperature control during film deposition" (Arizona Inventors)

ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,564,001, issued on Feb. 24, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Dual pyrometer systems for substrate temperature control during film deposition" was invented by Han Ye (Phoenix), Kai Zhou (Phoenix), Peipei Gao (Tempe, Ariz.), Wentao Wang (Phoenix), Kishor Patil (Chandler, Ariz.), Fan Gao (Tempe, Ariz.), Krishnaswamy Mahadevan (Phoenix), Xing Lin (Chandler, Ariz.), Alexandros Demos (Scottsdale, Ariz.), Yanfu Lu (Phoenix) and Amir Kajbafvala (Chandler, Ariz.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of operating a reactor system to provide multi-zone substrate temperature control. The method includes, with a first pyr...