US Patent Issued to ASM IP Holding on Dec. 23 for "Photosensitive material and method of forming patterned structures" (Belgian, Finnish Inventors)

ALEXANDRIA, Va., Dec. 23 -- United States Patent no. 12,504,689, issued on Dec. 23, was assigned to ASM IP Holding B.V. (Almer, Netherlands).

"Photosensitive material and method of forming patterned structures" was invented by Yoann Tomczak (Leuven, Belgium), Kishan Ashokbhai Patel (Leuven, Belgium) and Charles Dezelah (Helsinki).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and related systems for forming an EUV-sensitive layer. The methods comprise executing a plurality of deposition cycles. A deposition cycle comprises a first precursor pulse and a second precursor pulse. The first precursor pulse comprises exposing the substrate to a first precursor. The first precursor comprises two or more acyl...