US Patent Issued to ASM IP Holding on Aug. 4 for "Substrate treatment apparatus with virtual dummy wafer function and substrate treatment method" (Japanese Inventor)

ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,701,953, issued on Aug. 4, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Substrate treatment apparatus with virtual dummy wafer function and substrate treatment method" was invented by Yoshiyuki Umeoka (Fuchu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Examples of a substrate treatment apparatus includes a chamber, a substrate support stage located inside the chamber, an elevation device that moves the substrate support stage up and down, a gate valve provided between the chamber and an adjacent chamber that is adjacent to the chamber, and a chamber state controller including a processor and a memory configured to cause the proces...