US Patent Issued to ASM IP Holding on Aug. 18 for "Vapor deposition processes" (Finnish Inventors)

ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,709,802, issued on Aug. 18, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Vapor deposition processes" was invented by Timo Hatanpaa (Espoo, Finland), Anton Vihervaara (Helsinki) and Mikko Ritala (Espoo, Finland).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to methods for depositing an elemental metal or semimetal-containing material on a substrate by a cyclic deposition process, to an elemental metal or semimetal-containing layer, to a semiconductor structure and a device, and to deposition assemblies for depositing elemental metal or semimetal-containing material on a substrate. A method according to the cu...