US Patent Issued to ASM IP Holding on Aug. 18 for "Methods of filling a recessed feature on a substrate employing metal sequential infiltration synthesis processes" (Arizona Inventor)

ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,709,796, issued on Aug. 18, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Methods of filling a recessed feature on a substrate employing metal sequential infiltration synthesis processes" was invented by Krzysztof Kamil Kachel (Chandler, Ariz.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods for filling a recessed feature on a substrate employing metal sequential infiltration synthesis processes are disclosed. The disclosed methods include forming an organic layer within a recessed feature and introducing metal species into the organic layer to allow the formation of a metal seed layer. A bulk metal layer can subsequently be formed f...