ALEXANDRIA, Va., April 7 -- United States Patent no. 12,598,968, issued on April 7, was assigned to ASM IP Holding B.V. (Almere, Netherlands).
"Method of forming patterned structures" was invented by Yoann Tomczak (Leuven, Belgium), Ivan Zyulkov (Brussels), David Kurt de Roest (Leuven, Belgium), Michael Eugene Givens (Oud-Heverlee, Belgium), Daniele Piumi (Etterbeek, Belgium) and Charles Dezelah (Helsinki).
According to the abstract* released by the U.S. Patent & Trademark Office: "Methods of forming patterned features on a surface of a substrate are disclosed. Exemplary methods include gas-phase formation of a layer comprising an oxalate compound on a surface of the substrate. Portions of the layer comprising the oxalate compound can be ...