US Patent Issued to ASM IP Holding on April 7 for "Method and a substrate processing apparatus for forming an epitaxial stack on a plurality of substrates" (Belgian Inventor)

ALEXANDRIA, Va., April 7 -- United States Patent no. 12,595,587, issued on April 7, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Method and a substrate processing apparatus for forming an epitaxial stack on a plurality of substrates" was invented by Rami Khazaka (Leuven, Belgium).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for forming an epitaxial stack on a plurality of substrates comprises providing a plurality of substrates to a process chamber and executing deposition cycles, wherein each deposition cycle comprises a first deposition pulse and a second deposition pulse. The epitaxial stack comprises a first epitaxial layer stacked alternatingly and repeatedly with a second epita...