US Patent Issued to ASM IP Holding on April 21 for "Structure including a photoresist underlayer and method of forming same" (Belgian, Dutch, American Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,610,790, issued on April 21, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Structure including a photoresist underlayer and method of forming same" was invented by Yiting Sun (Leuven, Belgium), David de Roest (Kessel-Lo, Belgium), Daniele Piumi (Etterbeek, Belgium), Ivo Johannes Raaijmakers (Almere, Netherlands), BokHeon Kim (San Jose, Calif.), Timothee Blanquart (Oud-Heverlee, Belgium) and Yoann Tomczak (Leuven, Belgium).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods of forming structures including a photoresist underlayer and structures including the photoresist underlayer are disclosed. Exemplary methods include forming the phot...