ALEXANDRIA, Va., June 9 -- United States Patent no. 12,649,677, issued on June 9, was assigned to Arizona Board of Regents on behalf of Arizona State University (Scottsdale, Ariz.) and Haley & Aldrich Inc. (Burlington, Mass.).

"Microbial remediation of halogenated compounds via chain elongation and dehalogenation" was invented by Aide Robles (Mesa, Ariz.), Anca Delgado (Tempe, Ariz.), Maxwell Silverman (Tempe, Ariz.), Peter Bennett (Rochester, N.Y.) and Jacob Chu (Phoenix).

According to the abstract* released by the U.S. Patent & Trademark Office: "A system for environmental remediation of halogenated compounds such as chlorinated solvents is presented, the system comprising at least one bacterial strain capable of microbial chain elongat...