ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,730,372, issued on Sept. 8, was assigned to APPLIED MATERIALS Inc. (Santa Clara, Calif.).
"Imprint compositions with passivated nanoparticles and materials and processes for making the same" was invented by Amita Joshi (Fremont, Calif.), Andrew Ceballos (Palo Alto, Calif.), Kenichi Ohno (Sunnyvale, Calif.), Rami Hourani (Santa Clara, Calif.) and Ludovic Godet (Sunnyvale, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the present disclosure generally relate to imprint compositions and materials and related processes useful for nanoimprint lithography (NIL). In one or more embodiments, an imprint composition is provided and contains ...