US Patent Issued to Applied Materials on Sept. 22 for "Methods and mechanisms for modifying machine-learning models for new semiconductor processing equipment" (California Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,743,024, issued on Sept. 22, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Methods and mechanisms for modifying machine-learning models for new semiconductor processing equipment" was invented by Waheb Bishara (San Mateo, Calif.) and Subhasish Bandyopadhyay (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "An electronic device manufacturing system configured to identify, by a processor, a first machine-learning model trained to generate predictive data for a first process chamber and obtain metrology data associated with a substrate produced by a second process chamber. The manufacturing system is further configured to t...