ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,743,030, issued on Sept. 22, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Frequency and amplitude modulation of implant dose for stress management" was invented by Pradeep K. Subrahmanyan (Santa Clara, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the disclosure relate to techniques and apparatus for reducing out-of-plane distortion (OPD) in a substrate, as well as control of the effects of OPD and the effects that the modifications made to the substrate to correct for the OPD have on subsequent substrate processing operations performed on the substrate. The present embodiments employ novel techniques to reduce ...