US Patent Issued to Applied Materials on Sept. 22 for "Digital photolithography system, components thereof and related methods" (American, Israeli, Indian Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,743,029, issued on Sept. 22, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Digital photolithography system, components thereof and related methods" was invented by Assaf Kidron (Cupertino, Calif.), Rudolf Brunner (Menlo Park, Calif.), Davidi Kalir (Hod Hashron, Israel), Timothy Thomas (Portland, Ore.), Anilkumar Borkar (Bangalore, India) and Jiawei Shi (Union City, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the disclosure relate to digital lithography systems and components thereof. Digital lithography systems may include a rotation assembly for an exposure unit, including a kinematic socket configured to supp...