US Patent Issued to Applied Materials on Sept. 1 for "Radio frequency impedance matching network with flexible tuning algorithms" (California Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,724,401, issued on Sept. 1, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Radio frequency impedance matching network with flexible tuning algorithms" was invented by Yue Guo (Redwood City, Calif.), Kartik Ramaswamy (San Jose, Calif.), Jie Yu (Santa Clara, Calif.), Yang Yang (San Diego) and Farhad Moghadam (Saratoga, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments provided herein generally include apparatus and methods, controlled by flexible tuning algorithms, for generating a plasma in a plasma processing chamber. Flexible communications between equipment of the plasma processing system allows sharing of process infor...