US Patent Issued to Applied Materials on Sept. 1 for "Oblique angled ion implantation for substrate stress control" (Maine Inventor)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,725,758, issued on Sept. 1, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Oblique angled ion implantation for substrate stress control" was invented by Frank Sinclair (Hartland, Maine).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of stress management in a substrate, using angled ion implantation to introduced anisotropic stress within the substrate."

The patent was filed on June 28, 2024, under Application No. 18/758,499.

*For further information, including images, charts and tables, please visit: http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND...