US Patent Issued to Applied Materials on Oct. 20 for "Target profile for a physical vapor deposition chamber target" (American, Indian Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. D1,154,856, issued on Oct. 20, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Target profile for a physical vapor deposition chamber target" was invented by Martin Lee Riker (Round Rock, Texas), Fuhong Zhang (San Jose, Calif.) and Madan Kumar Shimoga Mylarappa (Bengaluru, India).

The patent was filed on Nov. 11, 2022, under Application No. D/859,692.

*For further information, including images, charts and tables, please visit: http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=D1154856&OS=D1154856&RS=D1154856

Disclaimer: Curated by HT Syndication....