US Patent Issued to Applied Materials on Oct. 20 for "Drying system with integrated substrate alignment stage" (California Inventor)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,772,776, issued on Oct. 20, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Drying system with integrated substrate alignment stage" was invented by Justin Ho Kuen Wong (Pleasanton, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate cleaning and drying system includes a cleaning station, a drying station positioned adjacent the cleaning station, a cleaner robot to transfer a substrate from the cleaning station to the drying station, an aligner stage adjacent to the drying station, a robot arm rotatable between a substantially vertical first position for receiving the substrate from the drying station and a substantially hor...