US Patent Issued to Applied Materials on Oct. 14 for "Transmission corrected plasma emission using in-situ optical reflectometry" (California Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,442,765, issued on Oct. 14, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Transmission corrected plasma emission using in-situ optical reflectometry" was invented by Patrick Tae (Sunnyvale, Calif.), Zhaozhao Zhu (Milpitas, Calif.), Blake W. Erickson (Gilroy, Calif.) and Chunlei Zhang (Santa Clara, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Implementations disclosed describe a system including a light source, an optical sensor, and a processing device. The light source directs, during a first time, a probe light into a processing chamber through a window. The light source ceases, during a second time, directing the probe light...