US Patent Issued to Applied Materials on Oct. 14 for "Machine learning model for semiconductor manufacturing processes" (Singaporean, American Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,444,655, issued on Oct. 14, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Machine learning model for semiconductor manufacturing processes" was invented by Zhiqiang Huang (Singapore), Li Ming Tan (Singapore), Joanna Kejun Loh (Singapore), Olivia Fatma Koentjoro (Waterford Residence, Singapore) and Roger Alan Lindley (Santa Clara, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "The disclosure describes methods and systems for training and deploying a machine learning predictive model for use in a semiconductor manufacturing process. Specifically, the present disclosure provides for training machine learning predictive models for ma...