US Patent Issued to Applied Materials on Nov. 3 for "Ion implanter ion source counter erosion endplate" (Massachusetts Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,785,028, issued on Nov. 3, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Ion implanter ion source counter erosion endplate" was invented by Craig R. Chaney (Gloucester, Mass.) and Adam M. McLaughlin (Merrimac, Mass.).

According to the abstract* released by the U.S. Patent & Trademark Office: "An ion source that includes a cathode near a first end plate and a non-planar second end plate is disclosed. The non-planar second end plate serves to counteract the effect of the plasma on the second end plate. In some embodiments, the plasma has the ability to erode the second end plate. Rather than making the entire second end plate thicker, the second end plate is only made t...