ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,473,637, issued on Nov. 18, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Interlock system for processing chamber exhaust assembly" was invented by Daemian Raj Benjamin Raj (Fremont, Calif.), Liliya I. Krivulina (Santa Clara, Calif.), Bharath Kumar Hanchanoor Rathnakara Gowda (Cupertino, Calif.), Collen Leng (San Jose, Calif.), Syed A. Alam (San Jose, Calif.), Uwe P. Haller (San Jose, Calif.), Robert Casanova (San Jose, Calif.), Ryan Thomas Downey (San Jose, Calif.) and Peter Standish (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Exemplary semiconductor processing systems may include a gas source coupled with a number...