US Patent Issued to Applied Materials on May 26 for "System to collect, recover and recycle chemical exhaust from semiconductor processing chambers" (Singaporean Inventors)

ALEXANDRIA, Va., May 26 -- United States Patent no. 12,636,592, issued on May 26, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"System to collect, recover and recycle chemical exhaust from semiconductor processing chambers" was invented by Andrea Leoncini (Singapore) and Zhijie Chua (Singapore).

According to the abstract* released by the U.S. Patent & Trademark Office: "Chemical precursor recovery systems and methods of recovering and reusing semiconductor manufacturing chemistry are disclosed. The recovery systems include a cold trap inlet line in fluid communication with a plurality of cold traps and a cold trap outlet line. The plurality of cold traps is configured to condense the chemical precursors and are arranged b...