US Patent Issued to Applied Materials on May 13 for "Systems and methods for analyzing defects in CVD films" (California Inventors)

ALEXANDRIA, Va., June 12 -- United States Patent no. 12,300,554, issued on May 13, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Systems and methods for analyzing defects in CVD films" was invented by Mandar B. Pandit (Milpitas, Calif.), Man-Ping Cai (Saratoga, Calif.), Wenhui Li (San Jose, Calif.), Michael Wenyoung Tsiang (Milpitas, Calif.), Praket Prakash Jha (San Jose, Calif.) and Jingmin Leng (Fremont, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the present technology may include semiconductor processing methods that include depositing a film of semiconductor material on a substrate in a substrate processing chamber. The deposited film may be sampled for defects ...