US Patent Issued to Applied Materials on March 31 for "Selective deposition processes on semiconductor substrates" (California Inventors)

ALEXANDRIA, Va., March 31 -- United States Patent no. 12,593,629, issued on March 31, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Selective deposition processes on semiconductor substrates" was invented by Mark Saly (Santa Clara, Calif.), Feng Q. Liu (San Jose, Calif.), Bhaskar Jyoti Bhuyan (San Jose, Calif.), Jeffrey W. Anthis (San Jose, Calif.) and David Thompson (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the disclosure relate to methods of selectively depositing polysilicon after forming a flowable polymer film to protect a substrate surface within a feature. A first silicon (Si) layer is deposited by physical vapor deposition (PVD). The flowable pol...