US Patent Issued to Applied Materials on March 31 for "Halide-free co-reactants for molybdenum film deposition" (Singaporean Inventors)

ALEXANDRIA, Va., March 31 -- United States Patent no. 12,590,370, issued on March 31, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Halide-free co-reactants for molybdenum film deposition" was invented by Andrea Leoncini (Singapore) and Chandan Kr Barik (Singapore).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods for depositing molybdenum-containing films on a semiconductor substrate are described. The substrate is exposed to a bis(arene)molybdenum (0) precursor and a halide-free reactant to form the molybdenum-containing film (e.g., molybdenum metal (elemental molybdenum), molybdenum carbide, molybdenum carbonitride, molybdenum silicide, molybdenum carbosilicide, molybdenum sulfide, mo...