US Patent Issued to Applied Materials on March 3 for "Multiplexed hologram interference exposure system" (California Inventors)

ALEXANDRIA, Va., March 3 -- United States Patent no. 12,566,335, issued on March 3, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Multiplexed hologram interference exposure system" was invented by Ulrich Mueller (Berkeley, Calif.) and David Markle (Pleasanton, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure provides an apparatus and method for fabricating optical devices. The apparatus includes a support table having process chambers and a laser used to direct a beam along a propagation path to each of the process chambers. A central mirror is centrally disposed among the process chambers and is rotatable to reflect the beam to each of the process chambers for pr...