US Patent Issued to Applied Materials on March 3 for "Controlling concentration profiles for deposited films using machine learning" (California Inventors)

ALEXANDRIA, Va., March 3 -- United States Patent no. 12,568,791, issued on March 3, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Controlling concentration profiles for deposited films using machine learning" was invented by Anton V Baryshnikov (Campbell, Calif.), Aykut Aydin (Sunnyvale, Calif.), Zubin Huang (Santa Clara, Calif.), Rui Cheng (San Jose, Calif.), Yi Yang (San Jose, Calif.), Diwakar Kedlaya (San Jose, Calif.), Venkatanarayana Shankaramurthy (San Jose, Calif.), Krishna Nittala (San Jose, Calif.) and Karthik Janakiraman (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A target concentration profile for a film to be deposited on a surface of a substrate during a dep...