US Patent Issued to Applied Materials on March 24 for "Pulsed voltage compensation for plasma processing applications" (California Inventors)

ALEXANDRIA, Va., March 24 -- United States Patent no. 12,586,768, issued on March 24, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Pulsed voltage compensation for plasma processing applications" was invented by Shreeram Jyoti Dash (San Jose, Calif.) and Michael Thomas Nichols (Sunnyvale, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments provided herein generally include apparatus, e.g., plasma processing systems, and methods for the plasma processing of a substrate in a processing chamber. Some embodiments are directed to a method for waveform generation, which generally includes delivering a first waveform with an associated setpoint from an energy source; detecting at leas...