US Patent Issued to Applied Materials on March 24 for "Method of thin film deposition in trenches" (California Inventors)

ALEXANDRIA, Va., March 24 -- United States Patent no. 12,584,211, issued on March 24, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Method of thin film deposition in trenches" was invented by Jinrui Guo (San Jose, Calif.), Ludovic Godet (Sunnyvale, Calif.), Rutger Meyer Timmerman Thijssen (Sunnyvale, Calif.), Yongan Xu (Santa Clara, Calif.), Jhenghan Yang (San Jose, Calif.) and Chien-An Chen (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the present disclosure generally relate to processing a workpiece containing a substrate during deposition, etching, and/or curing processes with a mask to have localized deposition on the workpiece. A mask is placed on a fir...