US Patent Issued to Applied Materials on March 17 for "Surface roughness reduction for photonics using high-temperature implantation" (New York, California, Massachusetts Inventors)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,578,531, issued on March 17, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Surface roughness reduction for photonics using high-temperature implantation" was invented by Eric Jay Simmons (Ballston Spa, N.Y.), Qintao Zhang (Mt Kisco, N.Y.), Wei Zou (Lexington, Mass.), Andrew Michael Waite (Beverly, Mass.), Jared Forrest Traynor (San Jose, Calif.), Miguel Sam Fung (Cupertino, Calif.), Vincent V. Granuzzo (Albany, N.Y.) and David J. Lee (Poughkeepsie, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed herein are approaches for forming a uniform film with reduced surface roughness for photonic applications. One method includes p...