US Patent Issued to Applied Materials on March 17 for "Semiconductor process equipment" (Indian, American Inventors)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,581,901, issued on March 17, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Semiconductor process equipment" was invented by Bhaskar Prasad (Adityapur, India), Kirankumar Neelasandra Savandaiah (Bangalore, India), Thomas Brezoczky (Los Gatos, Calif.) and Lakshmikanth Krishnamurthy Shirahatti (Bangalore, India).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate process station includes a housing including a transport region and process region. The process station further includes a magnetic levitation assembly disposed in the transport region configured to levitate and propel a substrate carrier. The magnetic levitation assembly i...