ALEXANDRIA, Va., March 17 -- United States Patent no. 12,580,155, issued on March 17, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Learning based tuning in a radio frequency plasma processing chamber" was invented by Yue Guo (Redwood City, Calif.), Kartik Ramaswamy (San Jose, Calif.) and Yang Yang (San Diego).

According to the abstract* released by the U.S. Patent & Trademark Office: "Some embodiments are directed to a method of processing a substrate in a plasma processing system. The method generally includes tuning a first capacitor and a second capacitor of a tuning circuit to match a first impedance corresponding to a first stage of a waveform, while a frequency of a radio frequency (RF) generator is preset to a fir...