ALEXANDRIA, Va., March 17 -- United States Patent no. 12,580,152, issued on March 17, was assigned to Applied Materials Inc. (Santa Clara, Calif.).
"Apparatus and method of damage mitigation and step coverage enhancement" was invented by Bencherki Mebarki (Santa Clara, Calif.), Sang-Heum Kim (Mountain View, Calif.) and Joung Joo Lee (San Jose, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments described herein provide an apparatus and method for fabricating semiconductor devices with improved process control and performance. The apparatus includes a processing chamber with first and second RF coil assemblies generating primary and secondary plasmas in distinct regions, along with first and sec...