US Patent Issued to Applied Materials on June 30 for "Hard mask stress modulation using low energy implant" (Massachusetts, California Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,672,524, issued on June 30, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Hard mask stress modulation using low energy implant" was invented by Vikram M. Bhosle (North Reading, Mass.), Deven Raj Mittal (Middleton, Mass.), Manohar Harsha Karigerasi (Sunnyvale, Calif.), Sarah Michelle Bobek (Santa Clara, Calif.) and Abdul Aziz Khaja (Morgan Hill, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided herein are devices and techniques for using a low-energy implant for hard mask stress modulation. In one approach, a method may include providing a stack of mandrel film layers, implanting an upper layer of the stack of mandrel film l...