US Patent Issued to Applied Materials on June 23 for "Shunt door for magnets in plasma process chamber" (American, Indian Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,662,737, issued on June 23, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Shunt door for magnets in plasma process chamber" was invented by Kallol Bera (Fremont, Calif.), Sathya Swaroop Ganta (Sunnyvale, Calif.), Timothy Joseph Franklin (Campbell, Calif.), Kaushik Alayavalli (Sunnyvale, Calif.), Akshay Dhanakshirur (Hubli, India), Stephen C. Garner (Newark, Calif.) and Bhaskar Kumar (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments described herein relate to magnetic and electromagnetic systems and a method for controlling the density profile of plasma generated in a process volume of a PECVD chamber to affect...