US Patent Issued to Applied Materials on June 23 for "Pre-clean chamber assembly architecture for improved serviceability" (Indian, American Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,666,897, issued on June 23, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Pre-clean chamber assembly architecture for improved serviceability" was invented by Songjae Lee (San Jose, Calif.), Avinash Shervegar (Karnataka, India), Srinivasa Rangappa (Bangalore, India), Sundarapandiyan Shanmugam (Bangalore, India), Ernesto J. Ulloa (San Jose, Calif.), Vinodh Ramachandran (Bangalore, India), Abraham Palaty (Bangalore, India) and Jaidev Rajaram (Bangalore, India).

According to the abstract* released by the U.S. Patent & Trademark Office: "Apparatus for processing a substrate are described herein. More specifically, embodiments described herein relate to separate pre-clean...