US Patent Issued to Applied Materials on July 7 for "Monolithic modular high-frequency plasma source" (California Inventors)

ALEXANDRIA, Va., July 7 -- United States Patent no. 12,676,289, issued on July 7, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Monolithic modular high-frequency plasma source" was invented by Thai Cheng Chua (Cupertino, Calif.) and Philip Allan Kraus (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments disclosed herein include a monolithic source array. In an embodiment, the monolithic source array comprises a dielectric plate having a first surface and a second surface opposite from the first surface. The monolithic source array may further comprise a plurality of protrusions that extend out from the first surface of the dielectric plate, wherein the plurality of pr...