US Patent Issued to Applied Materials on July 28 for "Apparatus and techniques for substrate processing using independent ion source and radical source" (Massachusetts Inventors)

ALEXANDRIA, Va., July 28 -- United States Patent no. 12,695,056, issued on July 28, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Apparatus and techniques for substrate processing using independent ion source and radical source" was invented by Anthony Renau (West Newbury, Mass.), Joseph C. Olson (Beverly, Mass.) and Peter F. Kurunczi (Cambridge, Mass.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A system may include a substrate stage to support a substrate, and a plurality of beam sources. The plurality of beam sources may include an ion beam source, the ion beam source arranged to direct an ion beam to the substrate, and a radical beam source, the radical beam source arranged to direct a...