ALEXANDRIA, Va., July 21 -- United States Patent no. 12,687,788, issued on July 21, was assigned to Applied Materials Inc. (Santa Clara, Calif.).
"System, software application, and method for dose uniformity improvement" was invented by Chi-Ming Tsai (San Jose, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the present disclosure relate to methods, systems and apparatus for improving dose uniformity of the photolithography system. The method includes projecting a write beam from a projection unit toward a mask to form a plurality of incident lights, adjusting the projection unit to create a distribution of incidence angles corresponding to the incident lights, focusing the plurality of ...