US Patent Issued to Applied Materials on July 21 for "Chemical mechanical polisher cleaning unit" (California Inventor)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,686,035, issued on July 21, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Chemical mechanical polisher cleaning unit" was invented by Clinton Sakata (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A rotating substrate support for use in a substrate processing system includes a cylindrical shaped outer hub having a first end, a second end, a wall that extends from the first end to the second end, and a central opening formed through the wall. The wall includes an inner surface, an outer surface, and a flexible region. A circumferential groove is formed in the outer surface of the wall and within the flexible region and i...