ALEXANDRIA, Va., July 14 -- United States Patent no. 12,683,121, issued on July 14, was assigned to Applied Materials Inc. (Santa Clara, Calif.).
"Pulsed voltage plasma processing apparatus and method" was invented by Shreeram Jyoti Dash (San Jose, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments provided herein generally include apparatus, plasma processing systems and methods for generation of a waveform for plasma processing of a substrate in a processing chamber that configured to adjust the timing and characteristics of the asymmetric voltage waveforms that are each provided to one or more electrodes or coils in a plasma processing chamber in an effort to improve the control of various ...