ALEXANDRIA, Va., July 14 -- United States Patent no. 12,685,050, issued on July 14, was assigned to Applied Materials Inc. (Santa Clara, Calif.).
"Methods and apparatus for processing a substrate" was invented by Kartik Ramaswamy (San Jose, Calif.), Yang Yang (Cupertino, Calif.), Kenneth Collins (San Jose, Calif.), Steven Lane (Porterville, Calif.), Gonzalo Monroy (Santa Clara, Calif.) and Yue Guo (Redwood City, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and apparatus for processing a substrate are provided herein. For example, a method for processing a substrate includes applying at least one of low frequency RF power or DC power to an upper electrode formed from a high secondary electron...