US Patent Issued to Applied Materials on July 14 for "In-situ reflectometry for real-time selectivity monitoring" (California Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,680,869, issued on July 14, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"In-situ reflectometry for real-time selectivity monitoring" was invented by Khokan C. Paul (Cupertino, Calif.), Tao Sheng (Santa Clara, Calif.), Qing Hong (Santa Clara, Calif.), Vinh N. Tran (San Jose, Calif.) and Zhepeng Cong (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "In one implementation, a method of monitoring film selectivity on a substrate, comprises: generating light from a light source; collimating the light from the light source to form a collimated beam; reflecting the collimated beam off of a surface to be measured to produce a ref...