US Patent Issued to Applied Materials on Jan. 27 for "Method of forming a MEOL contact structure" (California Inventors)

ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,538,542, issued on Jan. 27, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Method of forming a MEOL contact structure" was invented by Shumao Zhang (San Jose, Calif.), Le Zhang (San Jose, Calif.), Weifeng Ye (San Jose, Calif.), Chih-Hsun Hsu (Santa Clara, Calif.), David T. Or (Santa Clara, Calif.), Gary How (Santa Clara, Calif.), Yiyang Wan (Sunnyvale, Calif.), Liqi Wu (San Jose, Calif.) and Jiang Lu (Milpitas, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the disclosure include a method of forming contact structure on a semiconductor substrate. The method includes treating a native oxide layer formed on a contact ...